Thesyntheticquartzglass,namedZS,formerlyreferredasJGS1,isgenerallymanufacturedbythechemicalvaporousdepositionmethod(CVD)tohydrolysisandmeltthegaseoushigh-puritysilicontetrachlorideinahydrogen-oxygenflame.ItshowshightransmittancefromUVtonearinfrared,especiallyat200nmwiththetransmittanceupto90%.Thereisnofluorescence,nobubbles,nostripesintheproductandthestresscanreach2nm/cm,whichareirreplaceablebyordinaryopticalmaterials.WiththeOHcontainingaround1000ppm,itleadstostrongabsorptionintheinfraredspectroscopy(especiallyat2730nm). MetallicImpuritiesImpuritycontent　ppmproductAlFeCaMgTiCuMnNiCoKNaLiOHHP3001＜0.12＜0.05＜0.16＜0.02＜0.03＜0.01＜0.01＜0.01＜0.01＜0.04＜0.09＜0.01～1100 Transmission（T10mm） TransmissionSeriesSpectraltransmittance185nm200nm215nm240nm300nm～380nm1≥83%≥86%≥87%≥89%≥90%2≥70%≥81%≥81%≥82%≥90%3≥20%≥40%≥65%≥82%≥90%4Doesnotrequire≥16%≥36%≥66%≥90% HomogeneitySeriesMaximumdifferentialrefractiveindexΔn1≤2x10-62≤5x10-63≤10x10-64≤20x10-6 BirefringenceSeriesBirefringence nm/cm1≤21a≤42≤63≤104≤20 StripeSeriesStripecharacteristics1Nostreaksallowed2Individualstripesareallowed,thenumberisnomorethan10in1kgglass,andthewidthislessthan1mm RefractiveIndicesRefractiveIndices（at20℃；Nitrogenatmosphere;1atm） λ（nm）nn23252325.591.43290n19701970.561.43849n153015301.44424n106010601.44965nt1014.251.45021ns852.351.45243nr706.711.45511nc656.451.45633nc’644.031.45667nHe-Ne632.981.45698nD589.461.45837nd587.731.45843ne546.231.46004nf486.271.46309nf’480.131.46347ng435.961.46666nh404.771.46958ni365.121.47450n334334.241.47973n312312.661.48446n296296.821.48870n280280.431.49401n248248.351.50837n194194.231.55887n193193.371.56022n184184.951.57497nd=1.45843Vd=67.83nf-nc=0.00676ne=1.46004Ve=67.68nf’-nc’=0.00680 PhysicalandmechanicalpropertiesDensity2.20±0.02g/cm3bulkmodulus36GPaYong’smodulus82GPaShearmodulus25GPaCompressivestrength1250N/mm2Bendingstrength80-100N/mm2Poisson’sratio0.17KnoopHK0.1/20580MoHS5-6Stressopticalcoefficient(1/Pa)3.4×10-12Longitudinalultrasonicvelocity(m/s)5940Transversalultrasonicvelocity3770

Flamefusionquartzglassisatransparentquartzweightmadebyhydrogenandoxygenflamemeltinghighpuresilicasand,andobtainsquartzingotswithbetterspecificationandbetteruniformity,andthenobtainsbetterstressbyprecisionannealing(≤3nm/cm).Ithasthefeatureoflowthermalexpansioncoefficient(5.5×10-7),goodthermalstabilityandstrongphysicalandmechanicalproperties,anditismainlyusedforlargeandmedium-sizedspeculuminharshenvironments. ImpuritiesImpuritycontent　ppmproductAlFeCaMgTiCuMnNiCoBKNaLiOHHP300212.140.200.400.051.200.020.42——0.100.600.800.40～200 Relationwithviscosity&temperature Viscosity（lgη，泊）temperature（℃）Strainpoint14.51025±25Annealingpoint131120±25SofteningPoint7.61600±40

InfraredquartzglassnamedHS,formerlycalledJGS3,isgenerallymanufacturedbyelectromeltorplasmachemicalvapordeposition(PCVD),withthegreatadvantageofanextremelylowOHcontent(≤1ppm)andnoabsorptionatthe2730nmband.Itcompensatesforthedeficiencyofsyntheticquartzglass.High-purityquartzglassmadefromthePVCDprocesscanbeusedforthefullspectralband(190nm~3500nm). ImpuritiesImpuritycontent　ppmproductAlFeCaMgTiCuMnNiPbCoCrBKNaLiOHHP3003Electrofusion2.110.920.940.110.430.080.1—————0.950.580.41≤1HP3003Plasma0.090.030.040.010.030.010.010.01—0.02——0.090.100.01≤1 Transmission

Althoughquartzglassisthebestopticalmat-erial,itisstilldifficulttoqualifyforacertainband.Accordingtothecustomerrequirements,coatingonthequartzglassforpreventingoranti-reflectionisappliedtomeettheexpecteddesigneffect. Transmission

Calciumfluoridecrystalisakindoffluoridecrystals.Theadvantageofthismaterialisthewideapplicationbandwidth,whichcanbeusedin155nm-7000nm.Italsoshowshighlaserdamagethreshold,lowstressbirefringenceandhighrefractiveindex.Thedefectisthesofthardnessanditisnottemperatureresistant.Itcanbeusedinthefieldsoflaser（especiallydeepUVexcimerlaserlithography）,infrared,UVoptics,highenergydetection,asthebestmaterialformakingopticalelementssuchasopticalprisms,lensesandwindowsinopticalsystems. Transmission 氟化钙晶体性能IndicatornameNumericalvaluepurity%99.999densityg/cm33.18Thermalexpansioncoefficient1/℃1.89×10-5Refractiveindex5mm1.39908ThermalconductivityJ/k.m.s9.71Dielectricconstant1KHZ6.76HeatcapacityJ/g.K0.854Kjeldahlhardnesskg/mm2158.3Young'smodulusGPa75.8Meltingpoint℃1360Poisson'sratio0.26

HighpurityquartzglassisobtainedbyCVDorPCVDmethod.Theproducthashighpurity,withnobubble,nostripe,nofluorescence.Besides,ithassuperiorphysicalperformance.Thestressisupto2nm/cm.IthasdifferentOHcontentaccordingtothedifferentproductionprocesstomeetcustomerneeds.  Impurities&OHImpuritycontent  ppmproductAIFeCaMgTiCuMnNiCoBKNaLiOHHP3001B-1＜0.12＜0.05＜016＜0.02＜0.03＜0.01＜0.01＜0.01＜0.01—＜0.04＜0.09＜0.01～1100HP3001B-22.110.920.940.110.430.070.1———0.950.580.41≤5

Atransparentquartzroundingotisproducedusingtheflamefusionmethod.Itcanbeprocessedintotransparentquartzdisc,squareplate,flange,etc.,forwindowsandsemiconductorquartzaccessories.Byre-hotshaping,wecanobtainclearquartzingotandquartzplate.Bypullingprocesstomaketransparentquartztubeandquartzrod,theproductisusedforsemiconductoraccessorymaterials,opticalguidefibermanufacturingaccessories. Impurities（ppm）productAlFeCaMgTiCuMnNiCoBKNaLiOHHP3002B-117.430.860.590.051.100.150.020.030.04—0.380.742.30～200HP3002B-212.140.200.400.051.200.020.42——0.100.600.800.40～200 PhysicalandmechanicalpropertiesPropertyHP3002BDensity2.21x103kg/m3Hardness580KHN100TensileStrength4.9x107Pa(N/m2)CompressionStrength1.1x109PaCoefficientofThermalExpansion5.5x10-7/℃ThermalConductivity1.4w/m℃SpecificHeat680J/kg℃Softeningpoint1700℃Annealingpoint1210℃

LowOHquartzglassismadebyPlasmaFlameprocess,whichcanproduceroundingotandbereprocessedintoquartzplate,quartzflange,quartztube,quartzrod,etc.TheadvantageisthelowOHcontent(≤8ppm),whichiswidelyusedinsemiconductoraccessorymaterials.  Impurities（ppm）productAlFeCaMgTiCuMnNiCoBKNaLiOHHP3003-SS-B2.110.920.940.110.430.070.1———0.950.580.41≤8HP3003-AS-B12.140.200.400.051.200.020.42——0.100.600.800.40≤8HP3003-HK-B17.430.860.590.051.100.150.020.030.04—0.380.742.30≤8

Opaquequartztubematerialwithspecialwallthicknessisproducedusingrotationtechnology.Itcanbeusedasbakingfurnacepipeandheatinsulationmaterialorusingflamefusionmethodtoproduceopaquequartzglass,thenbeprocessedintoquartzplate.Ithasgoodheatinsulationandtemperatureresistanceproperty.Itismainlyusedinheatinsulationpartsinsemiconductorprocessing. Impurities（ppm）productAlFeCaMgCuKNaLiHPR3004A25.000.50.80.10.11.62.20.3HPR3004B45.01.01.50.750.152.55.01.5 Transmission（T4mm)wavelength400nm500nm600nm700nmHPR30041.0%1.2%1.2%1.2% PhysicalandmechanicalpropertiesPropertyHPR3004Density1.95x103kg/m3CompressionStrength1.0x109Pa(N/m2)CoefficientofThermalExpansion5.4x10-7/℃ThermalConductivity1.24W/℃•mSpecificHeat650J/kg℃Softeningpoint1600℃Annealingpoint1100℃

Quartzplates,quartzflangeandquartztubearereshapedbyhydrogen-oxygenflameheatmethodaccordingtothecustomerneeds.Theyaremadeintotransparentopaqueandheterogeneousquartzglassproducts,includingquartzboat,diffusiontube,semiconductorcleaningtank,quartzappliances,etc.Theyarewidelyusedinsemiconductor,photovoltaic,opticalfiberaccessoriesmaterials.